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Chemical Product and Process Modeling is Scopus-indexed (Q2, CiteScore 2.8), WoS ESCI. Published by Walter de Gruyter GmbH.
Checked against the index lists dated .
ISSN 1934-2659Verify ISSN ↗2194-6159Verify ISSN ↗
Publisher: Walter de Gruyter GmbH
Cost to publish: About US$2,712 to publish open access (publisher list price, via OpenAlex) — subscription publishing may be free
| Subject area | Rank | Pctile | Q |
|---|---|---|---|
| Modeling and Simulation | 188 / 397 | 52nd | Q2 |
| Chemical Engineering (all) | 154 / 270 | 43rd | Q3 |
Not listed in: DOAJ, ABDC, ABS / AJG, FT50, UT Dallas, ONOS (subscription), ONOS (APC covered)
Yes — actively indexed in Scopus, coverage 2006–present, best quartile Q2, CiteScore 2.8.
Chemical Product and Process Modeling is Q2 in Modeling and Simulation (rank 188 of 397) and Q3 in Chemical Engineering (all) (rank 154 of 270), by CiteScore 2025.
Chemical Product and Process Modeling is indexed in the Emerging Sources Citation Index, so it may have a Journal Impact Factor in Clarivate's Journal Citation Reports. JCR is paid, so check it for the current value. The closest free measure is its Scopus CiteScore 2.8, which places it in quartile Q2 at the 52nd percentile of its subject. Its SCImago Journal Rank (SJR, a free Scopus-based metric) is 0.274, quartile Q3, with an H-index of 24.
The publisher lists an article processing charge of about US$2,712 for open access (source: OpenAlex). Many journals also publish by the subscription route at no cost to the author, so confirm on the journal's own website.
Chemical Product and Process Modeling is published by Walter de Gruyter GmbH. Its print ISSN is 1934-2659 and its online ISSN is 2194-6159.
Yes — indexed in the Emerging Sources Citation Index.
No — it is not registered as an open-access journal in DOAJ or Scopus.
Chemical Product and Process Modeling has an h-index of 25 and a 2-year mean of 0.94 citations per paper (OpenAlex). Its Scopus CiteScore is 2.8, quartile Q2. On 2-year citations it ranks #218 of 323 Scopus journals in Modeling and Simulation.
Chemical Product and Process Modeling published 121 papers in 2025. 2026* is the year so far.
h-index, i10-index and 2-year mean citedness are open, licence-clear metrics from OpenAlex — not a proprietary impact factor. The subject rank counts only journals that OpenAlex has a figure for; it is not a Scopus or Clarivate ranking. Updated 2026-10-14.
In its latest 97 research articles (2025–2026), authors are most often from India (40%), China (15.9%) and Iran (6.2%).
Countries are counted fractionally, so a paper by authors from two countries counts half to each.
Scopus status: Active. No retracted papers are recorded. The Problematic Paper Screener flags 1 of its papers. These are indicators to check, not findings against the journal.
Retractions from OpenAlex; flags from the Problematic Paper Screener (Cabanac, Labbé & Magazinov, CC BY), 2026-09-21 export. A flag marks a paper for a closer look; it is not a finding against the journal.
Index data is curated from public sources (Scopus, Web of Science, ABDC, FT50, UT Dallas, DOAJ). CiteScore and quartiles reflect the latest available Scopus release. Always verify a journal's current status on its official source before submitting.
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