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Status
Inactive/Discontinued
Coverage
1995–2015
Source type
Journal
Open access
No
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Chemical Vapor Deposition
Chemical Vapor Deposition is not currently indexed in Scopus. Published by Wiley-VCH Verlag.
Checked against the index lists dated .
ISSN 0948-1907Verify ISSN ↗1521-3862Verify ISSN ↗
Publisher: Wiley-VCH Verlag
Scopus · Inactive
0
Indexed in
Cost to publish: No APC data — check the publisher
DOAJDirectory of Open Access Journals (live)
Not in DOAJ
Open accessNot registered as fully open access
Not listed in: Web of Science, DOAJ, ABDC, ABS / AJG, FT50, UT Dallas, ONOS (subscription), ONOS (APC covered)
Quick answers
Is Chemical Vapor Deposition indexed in Scopus?
No — it was previously covered by Scopus but its coverage is now inactive/discontinued (1995–2015).
What is the impact factor of Chemical Vapor Deposition?
Chemical Vapor Deposition has no Journal Impact Factor — JIF is published only for journals in the Web of Science Core Collection (SCIE, SSCI, AHCI and ESCI) — and Scopus has not published a current CiteScore for it either. Treat any "impact factor" quoted for this journal elsewhere as unofficial.
Who publishes Chemical Vapor Deposition and what is its ISSN?
Chemical Vapor Deposition is published by Wiley-VCH Verlag. Its print ISSN is 0948-1907 and its online ISSN is 1521-3862.
Is Chemical Vapor Deposition in Web of Science?
No — it is not currently in the Web of Science core collections (SCIE, SSCI, AHCI or ESCI).
Is Chemical Vapor Deposition open access?
No — it is not registered as an open-access journal in DOAJ or Scopus.
Scopus coverage history
Scopus indexed Chemical Vapor Deposition for 21 years, between 1995 and 2015. Coverage ended in 2015, 11 years ago, and Scopus now lists the title as inactive.
Is it still publishing? OpenAlex lists 1,485 works and 28,749 citations for the title. Its most recent paper is from 2015, in line with the end of Scopus coverage in 2015, which suggests the journal stopped publishing around then.
How well cited is Chemical Vapor Deposition? — open metrics via OpenAlex
Chemical Vapor Deposition has an h-index of 71 and a 2-year mean of 0 citations per paper (OpenAlex).
71
h-index
0
2-yr mean citations
711
i10-index
1,485
works indexed
28,749
total citations
Chemical Vapor Deposition published 59 papers in 2015; its busiest recent year was 2007 with 136. 2026* is the year so far.
Main topics
h-index, i10-index and 2-year mean citedness are open, licence-clear metrics from OpenAlex — not a proprietary impact factor. Updated 2026-10-14.
Are there integrity warnings for Chemical Vapor Deposition? — indicators, not proof of misconduct
Scopus status: Inactive — coverage ended 2015. No retracted papers are recorded. The Problematic Paper Screener flags none of its papers. These are indicators to check, not findings against the journal.
- Scopus statusInactive — coverage ended 2015
- Retracted papers None recorded
- Problematic Paper Screener flags None flagged
Retractions from OpenAlex; flags from the Problematic Paper Screener (Cabanac, Labbé & Magazinov, CC BY), 2026-09-21 export. A flag marks a paper for a closer look; it is not a finding against the journal.
Official sources & links
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Wiley-VCH Verlag has 87 other titles in our data; 66 are currently indexed in Scopus.
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Index data is curated from public sources (Scopus, Web of Science, ABDC, FT50, UT Dallas, DOAJ). CiteScore and quartiles reflect the latest available Scopus release. Always verify a journal's current status on its official source before submitting.
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