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Chemical Vapor Deposition

Chemical Vapor Deposition is not currently indexed in Scopus. Published by Wiley-VCH Verlag.

ISSN 0948-1907Verify ISSN ↗1521-3862Verify ISSN ↗

Publisher: Wiley-VCH Verlag

Scopus · Inactive
0
Indexed in
major indexes

Cost to publish: No APC data — check the publisher

Web of ScienceClarivate (SCIE/SSCI/AHCI/ESCI)
Not listed in Web of Science.
ABDCAustralian Business Deans Council 2025
Not listed in ABDC.
DOAJDirectory of Open Access Journals (live)
Not in DOAJ
Open accessNot registered as fully open access
FT50Financial Times research list
Not listed in FT50.
UT DallasUTD top-100 business research
Not listed in UT Dallas.
ONOS · APC coveredOne Nation One Subscription (Govt of India)
Not in the ONOS APC-supported list.
Publishing in this journal is not centrally APC-funded under One Nation One Subscription.

Is Chemical Vapor Deposition indexed in Scopus? No — it was previously covered by Scopus but its coverage is now inactive/discontinued (1995–2015).

What is the impact factor of Chemical Vapor Deposition? Chemical Vapor Deposition has no Journal Impact Factor — JIF is published only for Web of Science SCIE and SSCI titles — and Scopus has not published a current CiteScore for it either. Treat any "impact factor" quoted for this journal elsewhere as unofficial.

Is Chemical Vapor Deposition in Web of Science? No — it is not currently in the Web of Science core collections (SCIE, SSCI, AHCI or ESCI).

Is Chemical Vapor Deposition open access? No — it is not registered as an open-access journal in DOAJ or Scopus.

Impact & reach — open metrics via OpenAlex

71
h-index
0
2-yr mean citations
711
i10-index
1,485
works indexed
28,749
total citations
Papers published per year
01002002006: 135 papers13520062007: 136 papers13620072008: 70 papers7020082009: 66 papers6620092010: 63 papers6320102011: 68 papers6820112012: 64 papers6420122013: 68 papers6820132014: 62 papers6220142015: 59 papers592015

Chemical Vapor Deposition published 59 papers in 2015; its busiest recent year was 2007 with 136. 2026* is the year so far.

Main topics
Semiconductor materials and devicesCopper Interconnects and ReliabilityElectronic and Structural Properties of OxidesMetal and Thin Film Mechanics

h-index, i10-index and 2-year mean citedness are open, licence-clear metrics from OpenAlex — not a proprietary impact factor. Updated 2026-09-24.

Integrity signals — indicators, not proof of misconduct

  • Scopus statusInactive — coverage ended 2015
  • Retracted papers None recorded

Retractions and authorship from OpenAlex; Scopus status from the Scopus source list. A signal marks something to look at more closely; it is not a finding against the journal.

Official sources & links

Scopus source ↗ ISSN Portal · 0948-1907 ↗ISSN Portal · 1521-3862 ↗

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Index data is curated from public sources (Scopus, Web of Science, ABDC, FT50, UT Dallas, DOAJ). CiteScore and quartiles reflect the latest available Scopus release. Always verify a journal's current status on its official source before submitting.