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    International Journal of Thin Film Science and Technology

    International Journal of Thin Film Science and Technology is Scopus-indexed (Q3, CiteScore 2.2). Published by Natural Sciences Publishing.

    Checked against the index lists dated 4 October 2026.

    ISSN 2090-9519Verify ISSN ↗2090-9527Verify ISSN ↗

    Publisher: Natural Sciences Publishing

    Scopus · Q3
    2.2
    CiteScore 2025
    Scopus
    Q3
    Best quartile
    rank 258 of 408 · 36th pctile
    1
    Indexed in
    major index

    Cost to publish: No APC data — check the publisher

    ScopusElsevier Scopus
    Status
    Active
    Coverage
    2018–present
    Source type
    Journal
    Open access
    No
    CiteScore
    2.2
    SJR · SCImago
    0.264
    Q3 SJR quartile
    H-index
    13
    Best quartile
    Q3 · 36th pctile
    Subject areaRankPctileQ
    Mechanics of Materials258 / 40836thQ3
    Surfaces, Coatings and Films94 / 14133rdQ3
    Surfaces and Interfaces48 / 6324thQ4
    View this source on Scopus.com
    DOAJDirectory of Open Access Journals (live)
    Not in DOAJ
    Open accessNot registered as fully open access

    Not listed in: Web of Science, DOAJ, ABDC, ABS / AJG, FT50, UT Dallas, ONOS (subscription), ONOS (APC covered)

    Quick answers

    Is International Journal of Thin Film Science and Technology indexed in Scopus?

    Yes — actively indexed in Scopus, coverage 2018–present, best quartile Q3, CiteScore 2.2.

    What quartile is International Journal of Thin Film Science and Technology in Scopus?

    International Journal of Thin Film Science and Technology is Q3 in Mechanics of Materials (rank 258 of 408), Q3 in Surfaces, Coatings and Films (rank 94 of 141) and Q4 in Surfaces and Interfaces (rank 48 of 63), by CiteScore 2025.

    What is the impact factor of International Journal of Thin Film Science and Technology?

    International Journal of Thin Film Science and Technology is not in the Web of Science Core Collection (SCIE, SSCI, AHCI or ESCI), so Clarivate publishes no Journal Impact Factor for it. Its Scopus CiteScore is 2.2, quartile Q3, 36th percentile. Any "impact factor" quoted elsewhere is not the Clarivate metric. Its SCImago Journal Rank (SJR, a free Scopus-based metric) is 0.264, quartile Q3, with an H-index of 13.

    Who publishes International Journal of Thin Film Science and Technology and what is its ISSN?

    International Journal of Thin Film Science and Technology is published by Natural Sciences Publishing. Its print ISSN is 2090-9519 and its online ISSN is 2090-9527.

    Is International Journal of Thin Film Science and Technology in Web of Science?

    No — it is not currently in the Web of Science core collections (SCIE, SSCI, AHCI or ESCI).

    Is International Journal of Thin Film Science and Technology open access?

    No — it is not registered as an open-access journal in DOAJ or Scopus.

    How well cited is International Journal of Thin Film Science and Technology? — open metrics via OpenAlex

    International Journal of Thin Film Science and Technology has an h-index of 14 and a 2-year mean of 1.21 citations per paper (OpenAlex). Its Scopus CiteScore is 2.2, quartile Q3. On 2-year citations it ranks #244 of 376 Scopus journals in Mechanics of Materials.

    14
    h-index
    1.21
    2-yr mean citations
    42
    i10-index
    329
    works indexed
    1,246
    total citations
    2-yr mean citations, among Scopus journals in the same subject
    #244 of 376 Bottom 36% Mechanics of Materials
    #89 of 128 Bottom 31% Surfaces, Coatings and Films
    #45 of 59 Bottom 24% Surfaces and Interfaces
    Papers published per year
    0501002017: 21 papers2120172018: 13 papers1320182019: 3 papers320192020: 33 papers3320202021: 36 papers3620212022: 51 papers5120222023: 30 papers3020232024: 42 papers4220242025: 31 papers3120252026: 12 papers so far122026*

    International Journal of Thin Film Science and Technology published 31 papers in 2025; its busiest recent year was 2022 with 51. 2026* is the year so far.

    Main topics
    Chalcogenide Semiconductor Thin FilmsQuantum Dots Synthesis And PropertiesZnO doping and propertiesSemiconductor materials and interfaces

    h-index, i10-index and 2-year mean citedness are open, licence-clear metrics from OpenAlex — not a proprietary impact factor. The subject rank counts only journals that OpenAlex has a figure for; it is not a Scopus or Clarivate ranking. Updated 2026-10-14.

    Are there integrity warnings for International Journal of Thin Film Science and Technology? — indicators, not proof of misconduct

    Scopus status: Active. No retracted papers are recorded. The Problematic Paper Screener flags none of its papers. These are indicators to check, not findings against the journal.

    • Scopus statusActive
    • Retracted papers None recorded
    • Problematic Paper Screener flags None flagged

    Retractions from OpenAlex; flags from the Problematic Paper Screener (Cabanac, Labbé & Magazinov, CC BY), 2026-09-21 export. A flag marks a paper for a closer look; it is not a finding against the journal.

    Official sources & links

    Journal website ↗ Scopus source ↗ ISSN Portal · 2090-9519 ↗ISSN Portal · 2090-9527 ↗

    Community experience: reader comments on this journal

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    Index data is curated from public sources (Scopus, Web of Science, ABDC, FT50, UT Dallas, DOAJ). CiteScore and quartiles reflect the latest available Scopus release. Always verify a journal's current status on its official source before submitting.

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