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Plasma Chemistry and Plasma Processing is Scopus-indexed (Q2, CiteScore 5.9), WoS SCIE. It is covered by India's One Nation One Subscription scheme for reading access. Published by Springer New York.
Checked against the index lists dated .
ISSN 0272-4324Verify ISSN ↗1572-8986Verify ISSN ↗
Publisher: Springer New York
Cost to publish: About US$3,790 to publish open access (publisher list price, via OpenAlex) — subscription publishing may be free
| Subject area | Rank | Pctile | Q |
|---|---|---|---|
| Condensed Matter Physics | 115 / 446 | 74th | Q2 |
| Surfaces, Coatings and Films | 41 / 141 | 71st | Q2 |
| Chemistry (all) | 123 / 402 | 69th | Q2 |
| Chemical Engineering (all) | 88 / 270 | 67th | Q2 |
Not listed in: DOAJ, ABDC, ABS / AJG, FT50, UT Dallas, ONOS (APC covered)
Yes — actively indexed in Scopus, coverage 1981–present, best quartile Q2, CiteScore 5.9.
Plasma Chemistry and Plasma Processing is Q2 in Condensed Matter Physics (rank 115 of 446), Q2 in Surfaces, Coatings and Films (rank 41 of 141) and Q2 in Chemistry (all) (rank 123 of 402), by CiteScore 2025. It is ranked in 4 subject areas in all.
Plasma Chemistry and Plasma Processing is indexed in the Science Citation Index Expanded, so it may have a Journal Impact Factor in Clarivate's Journal Citation Reports. JCR is paid, so check it for the current value. The closest free measure is its Scopus CiteScore 5.9, which places it in quartile Q2 at the 74th percentile of its subject. Its SCImago Journal Rank (SJR, a free Scopus-based metric) is 0.585, quartile Q2, with an H-index of 89.
The publisher lists an article processing charge of about US$3,790 for open access (source: OpenAlex). Many journals also publish by the subscription route at no cost to the author, so confirm on the journal's own website.
Plasma Chemistry and Plasma Processing is published by Springer New York. Its print ISSN is 0272-4324 and its online ISSN is 1572-8986.
Yes. It is part of the One Nation One Subscription (ONOS) national subscription, so readers at participating Indian institutions get its full text. ONOS does not cover its article processing charge.
Yes — indexed in the Science Citation Index Expanded.
No — it is not registered as an open-access journal in DOAJ or Scopus.
Plasma Chemistry and Plasma Processing has an h-index of 99 and a 2-year mean of 3.16 citations per paper (OpenAlex). Its Scopus CiteScore is 5.9, quartile Q2. On 2-year citations it ranks #145 of 425 Scopus journals in Condensed Matter Physics.
Plasma Chemistry and Plasma Processing published 83 papers in 2025; its busiest recent year was 2023 with 127. 2026* is the year so far.
h-index, i10-index and 2-year mean citedness are open, licence-clear metrics from OpenAlex — not a proprietary impact factor. The subject rank counts only journals that OpenAlex has a figure for; it is not a Scopus or Clarivate ranking. Updated 2026-10-14.
In its latest 100 research articles (2025–2026), authors are most often from China (22.3%), United States (10%) and Japan (8.5%).
Countries are counted fractionally, so a paper by authors from two countries counts half to each.
Scopus status: Active. No retracted papers are recorded. The Problematic Paper Screener flags none of its papers. These are indicators to check, not findings against the journal.
Retractions from OpenAlex; flags from the Problematic Paper Screener (Cabanac, Labbé & Magazinov, CC BY), 2026-09-21 export. A flag marks a paper for a closer look; it is not a finding against the journal.
Index data is curated from public sources (Scopus, Web of Science, ABDC, FT50, UT Dallas, DOAJ). CiteScore and quartiles reflect the latest available Scopus release. Always verify a journal's current status on its official source before submitting.
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