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Recent Patents on Nanotechnology is Scopus-indexed (Q1, CiteScore 6.3), WoS SCIE. It is covered by India's One Nation One Subscription scheme for reading access. Published by Bentham Science Publishers.
Checked against the index lists dated .
ISSN 1872-2105Verify ISSN ↗2212-4020Verify ISSN ↗
Publisher: Bentham Science Publishers
Cost to publish: No APC data — check the publisher
| Subject area | Rank | Pctile | Q |
|---|---|---|---|
| Engineering (all) | 61 / 351 | 82nd | Q1 |
| Condensed Matter Physics | 104 / 446 | 76th | Q1 |
| Materials Science (all) | 146 / 475 | 69th | Q2 |
Not listed in: DOAJ, ABDC, ABS / AJG, FT50, UT Dallas, ONOS (APC covered)
Yes — actively indexed in Scopus, coverage 2007–present, best quartile Q1, CiteScore 6.3.
Recent Patents on Nanotechnology is Q1 in Engineering (all) (rank 61 of 351), Q1 in Condensed Matter Physics (rank 104 of 446) and Q2 in Materials Science (all) (rank 146 of 475), by CiteScore 2025.
Recent Patents on Nanotechnology is indexed in the Science Citation Index Expanded, so it may have a Journal Impact Factor in Clarivate's Journal Citation Reports. JCR is paid, so check it for the current value. The closest free measure is its Scopus CiteScore 6.3, which places it in quartile Q1 at the 82nd percentile of its subject. Its SCImago Journal Rank (SJR, a free Scopus-based metric) is 0.398, quartile Q2, with an H-index of 41.
Recent Patents on Nanotechnology is published by Bentham Science Publishers. Its print ISSN is 1872-2105 and its online ISSN is 2212-4020.
Yes. It is part of the One Nation One Subscription (ONOS) national subscription, so readers at participating Indian institutions get its full text. ONOS does not cover its article processing charge.
Yes — indexed in the Science Citation Index Expanded.
No — it is not registered as an open-access journal in DOAJ or Scopus.
Recent Patents on Nanotechnology has an h-index of 44 and a 2-year mean of 1.79 citations per paper (OpenAlex). Its Scopus CiteScore is 6.3, quartile Q1. On 2-year citations it ranks #111 of 299 Scopus journals in Engineering (all).
Recent Patents on Nanotechnology published 24 papers in 2025; its busiest recent year was 2023 with 58. 2026* is the year so far.
h-index, i10-index and 2-year mean citedness are open, licence-clear metrics from OpenAlex — not a proprietary impact factor. The subject rank counts only journals that OpenAlex has a figure for; it is not a Scopus or Clarivate ranking. Updated 2026-10-14.
In its latest 85 research articles (2023–2026), authors are most often from India (63.1%), China (13.3%) and Saudi Arabia (2.9%). More than half of recent authorship comes from one country.
Countries are counted fractionally, so a paper by authors from two countries counts half to each.
Scopus status: Active. No retracted papers are recorded. The Problematic Paper Screener flags none of its papers. These are indicators to check, not findings against the journal.
Retractions from OpenAlex; flags from the Problematic Paper Screener (Cabanac, Labbé & Magazinov, CC BY), 2026-09-21 export. A flag marks a paper for a closer look; it is not a finding against the journal.
Index data is curated from public sources (Scopus, Web of Science, ABDC, FT50, UT Dallas, DOAJ). CiteScore and quartiles reflect the latest available Scopus release. Always verify a journal's current status on its official source before submitting.
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