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Journal of Micro/Nanopatterning, Materials and Metrology is indexed in Web of Science (SCIE). Its Scopus CiteScore is 4.3, quartile Q2. It is covered by India's One Nation One Subscription scheme for reading access. Published by SPIE.
Checked against the index lists dated .
ISSN 1932-5134Verify ISSN ↗1932-5150Verify ISSN ↗
Publisher: SPIE
Cost to publish: No APC data — check the publisher
| Subject area | Rank | Pctile | Q |
|---|---|---|---|
| Electrical and Electronic Engineering | 370 / 1030 | 64th | Q2 |
| Mechanical Engineering | 268 / 740 | 63rd | Q2 |
| Condensed Matter Physics | 192 / 446 | 57th | Q2 |
| Atomic and Molecular Physics, and Optics | 105 / 243 | 56th | Q2 |
| Electronic, Optical and Magnetic Materials | 151 / 318 | 52nd | Q2 |
Not listed in: DOAJ, ABDC, ABS / AJG, FT50, UT Dallas, ONOS (APC covered)
No — it was previously covered by Scopus but its coverage is now inactive/discontinued (2007–2020).
Journal of Micro/Nanopatterning, Materials and Metrology is indexed in the Science Citation Index Expanded, so it may have a Journal Impact Factor in Clarivate's Journal Citation Reports. JCR is paid, so check it for the current value. The closest free measure is its Scopus CiteScore 4.3, which places it in quartile Q2 at the 64th percentile of its subject. Its SCImago Journal Rank (SJR, a free Scopus-based metric) is 0.437, quartile Q2, with an H-index of 20.
Journal of Micro/Nanopatterning, Materials and Metrology is published by SPIE. Its print ISSN is 1932-5134 and its online ISSN is 1932-5150.
Yes. It is part of the One Nation One Subscription (ONOS) national subscription, so readers at participating Indian institutions get its full text. ONOS does not cover its article processing charge.
Yes — indexed in the Science Citation Index Expanded.
No — it is not registered as an open-access journal in DOAJ or Scopus.
Journal of Micro/Nanopatterning, Materials and Metrology has an h-index of 48 and a 2-year mean of 0 citations per paper (OpenAlex). Its Scopus CiteScore is 4.3, quartile Q2.
Journal of Micro/Nanopatterning, Materials and Metrology published 31 papers in 2020; its busiest recent year was 2014 with 130. 2026* is the year so far.
h-index, i10-index and 2-year mean citedness are open, licence-clear metrics from OpenAlex — not a proprietary impact factor. Updated 2026-10-14.
Scopus status: Inactive — coverage ended 2020. No retracted papers are recorded. The Problematic Paper Screener flags none of its papers. These are indicators to check, not findings against the journal.
Retractions from OpenAlex; flags from the Problematic Paper Screener (Cabanac, Labbé & Magazinov, CC BY), 2026-09-21 export. A flag marks a paper for a closer look; it is not a finding against the journal.
Index data is curated from public sources (Scopus, Web of Science, ABDC, FT50, UT Dallas, DOAJ). CiteScore and quartiles reflect the latest available Scopus release. Always verify a journal's current status on its official source before submitting.
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