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    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films is Scopus-indexed (Q3, CiteScore 3.7), WoS SCIE. It is covered by India's One Nation One Subscription scheme for reading access. Published by AVS Science and Technology Society.

    Checked against the index lists dated 4 October 2026.

    ISSN 0734-2101Verify ISSN ↗1520-8559Verify ISSN ↗

    Publisher: AVS Science and Technology Society

    Scopus · Q3WoS · SCIEONOS
    3.7
    CiteScore 2025
    Scopus
    Q3
    Best quartile
    rank 225 of 446 · 49th pctile
    2
    Indexed in
    major indexes

    Cost to publish: No APC data — check the publisher

    ScopusElsevier Scopus
    Status
    Active
    Coverage
    1982–present (also 1970)
    Source type
    Journal
    Open access
    No
    CiteScore
    3.7
    SJR · SCImago
    0.431
    Q2 SJR quartile
    H-index
    131
    Best quartile
    Q3 · 49th pctile
    Subject areaRankPctileQ
    Condensed Matter Physics225 / 44649thQ3
    Surfaces, Coatings and Films72 / 14149thQ3
    Surfaces and Interfaces36 / 6343rdQ3
    View this source on Scopus.com
    Web of ScienceClarivate (SCIE/SSCI/AHCI/ESCI)
    Collections
    SCIE
    Categories
    Materials Science, Coatings & FilmsPhysics, Applied
    View this source on Web of Science Check JIF in JCR
    DOAJDirectory of Open Access Journals (live)
    Not in DOAJ
    Open accessNot registered as fully open access
    ONOS · SubscriptionOne Nation One Subscription — full-text access
    This journal is part of the ONOS national subscription — readers at an ONOS-subscribed Indian institution get full-text access to its articles at no cost.
    Access depends on your institution’s ONOS participation; the subscribed title list is subject to revision.
    Learn about ONOS

    Not listed in: DOAJ, ABDC, ABS / AJG, FT50, UT Dallas, ONOS (APC covered)

    Quick answers

    Is Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films indexed in Scopus?

    Yes — actively indexed in Scopus, coverage 1982–present (also 1970), best quartile Q3, CiteScore 3.7.

    What quartile is Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films in Scopus?

    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films is Q3 in Condensed Matter Physics (rank 225 of 446), Q3 in Surfaces, Coatings and Films (rank 72 of 141) and Q3 in Surfaces and Interfaces (rank 36 of 63), by CiteScore 2025.

    What is the impact factor of Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films?

    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films is indexed in the Science Citation Index Expanded, so it may have a Journal Impact Factor in Clarivate's Journal Citation Reports. JCR is paid, so check it for the current value. The closest free measure is its Scopus CiteScore 3.7, which places it in quartile Q3 at the 49th percentile of its subject. Its SCImago Journal Rank (SJR, a free Scopus-based metric) is 0.431, quartile Q2, with an H-index of 131.

    Who publishes Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films and what is its ISSN?

    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films is published by AVS Science and Technology Society. Its print ISSN is 0734-2101 and its online ISSN is 1520-8559.

    Is Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films covered under ONOS in India?

    Yes. It is part of the One Nation One Subscription (ONOS) national subscription, so readers at participating Indian institutions get its full text. ONOS does not cover its article processing charge.

    Is Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films in Web of Science?

    Yes — indexed in the Science Citation Index Expanded.

    Is Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films open access?

    No — it is not registered as an open-access journal in DOAJ or Scopus.

    How well cited is Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films? — open metrics via OpenAlex

    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films has an h-index of 177 and a 2-year mean of 2.66 citations per paper (OpenAlex). Its Scopus CiteScore is 3.7, quartile Q3. On 2-year citations it ranks #173 of 425 Scopus journals in Condensed Matter Physics.

    177
    h-index
    2.66
    2-yr mean citations
    9,647
    i10-index
    18,162
    works indexed
    403,677
    total citations
    2-yr mean citations, among Scopus journals in the same subject
    #173 of 425 Top 41% Condensed Matter Physics
    #60 of 128 Top 47% Surfaces, Coatings and Films
    #30 of 59 Bottom 50% Surfaces and Interfaces
    Papers published per year
    02505002017: 212 papers21220172018: 195 papers19520182019: 222 papers22220192020: 320 papers32020202021: 305 papers30520212022: 242 papers24220222023: 332 papers33220232024: 343 papers34320242025: 316 papers31620252026: 259 papers so far2592026*

    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films published 316 papers in 2025; its busiest recent year was 2024 with 343. 2026* is the year so far.

    Main topics
    Semiconductor materials and devicesMetal and Thin Film MechanicsPlasma Diagnostics and ApplicationsIon-surface interactions and analysis

    h-index, i10-index and 2-year mean citedness are open, licence-clear metrics from OpenAlex — not a proprietary impact factor. The subject rank counts only journals that OpenAlex has a figure for; it is not a Scopus or Clarivate ranking. Updated 2026-10-14.

    Who publishes in Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films? — latest 100 articles, 2026

    In its latest 100 research articles (2026), authors are most often from United States (37.8%), China (13.2%) and Japan (7%).

    Author countriesUnited StatesUnited States37.8%ChinaChina13.2%JapanJapan7%South KoreaSouth Korea6%MexicoMexico4.5%BelgiumBelgium4.5% Most frequent institutions (papers)IMECIMEC4KU LeuvenKU Leuven3University at Albany, State University of New YorkUniversity at Albany, State Uni…3University of Illinois Urbana-ChampaignUniversity of Illinois Urbana-C…3Argonne National LaboratoryArgonne National Laboratory3

    Countries are counted fractionally, so a paper by authors from two countries counts half to each.

    Are there integrity warnings for Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films? — indicators, not proof of misconduct

    Scopus status: Active. 2 retracted papers are recorded (0.1 per 1,000 papers). The Problematic Paper Screener flags none of its papers. These are indicators to check, not findings against the journal.

    • Scopus statusActive
    • Retracted papers 2 · 0.1 per 1,000 papers
    • Problematic Paper Screener flags None flagged

    Retractions from OpenAlex; flags from the Problematic Paper Screener (Cabanac, Labbé & Magazinov, CC BY), 2026-09-21 export. A flag marks a paper for a closer look; it is not a finding against the journal.

    Official sources & links

    Journal website ↗ Scopus source ↗ Web of Science ↗ ISSN Portal · 0734-2101 ↗ISSN Portal · 1520-8559 ↗

    Community experience: reader comments on this journal

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