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Plasma Sources Science and Technology is Scopus-indexed (Q1, CiteScore 6.6), WoS SCIE. It is covered by India's One Nation One Subscription scheme for reading access. Published by IOP Publishing Ltd..
Checked against the index lists dated .
ISSN 0963-0252Verify ISSN ↗1361-6595Verify ISSN ↗
Publisher: IOP Publishing Ltd.
Cost to publish: About US$3,325 to publish open access (publisher list price, via OpenAlex) — subscription publishing may be free
| Subject area | Rank | Pctile | Q |
|---|---|---|---|
| Condensed Matter Physics | 96 / 446 | 78th | Q1 |
Not listed in: DOAJ, ABDC, ABS / AJG, FT50, UT Dallas, ONOS (APC covered)
Yes — actively indexed in Scopus, coverage 1992–present, best quartile Q1, CiteScore 6.6.
Plasma Sources Science and Technology is Q1 in Condensed Matter Physics (rank 96 of 446), by CiteScore 2025.
Plasma Sources Science and Technology is indexed in the Science Citation Index Expanded, so it may have a Journal Impact Factor in Clarivate's Journal Citation Reports. JCR is paid, so check it for the current value. The closest free measure is its Scopus CiteScore 6.6, which places it in quartile Q1 at the 78th percentile of its subject. Its SCImago Journal Rank (SJR, a free Scopus-based metric) is 0.682, quartile Q2, with an H-index of 132.
The publisher lists an article processing charge of about US$3,325 for open access (source: OpenAlex). Many journals also publish by the subscription route at no cost to the author, so confirm on the journal's own website.
Plasma Sources Science and Technology is published by IOP Publishing Ltd. Its print ISSN is 0963-0252 and its online ISSN is 1361-6595.
Yes. It is part of the One Nation One Subscription (ONOS) national subscription, so readers at participating Indian institutions get its full text. ONOS does not cover its article processing charge.
Yes — indexed in the Science Citation Index Expanded.
No — it is not registered as an open-access journal in DOAJ or Scopus.
Plasma Sources Science and Technology has an h-index of 147 and a 2-year mean of 3.26 citations per paper (OpenAlex). Its Scopus CiteScore is 6.6, quartile Q1. On 2-year citations it ranks #139 of 425 Scopus journals in Condensed Matter Physics.
Plasma Sources Science and Technology published 238 papers in 2025; its busiest recent year was 2020 with 299. 2026* is the year so far.
h-index, i10-index and 2-year mean citedness are open, licence-clear metrics from OpenAlex — not a proprietary impact factor. The subject rank counts only journals that OpenAlex has a figure for; it is not a Scopus or Clarivate ranking. Updated 2026-10-14.
In its latest 99 research articles (2026), authors are most often from China (25.4%), South Korea (14.5%) and United States (13.3%).
Countries are counted fractionally, so a paper by authors from two countries counts half to each.
Scopus status: Active. 1 retracted paper is recorded (0.2 per 1,000 papers). The Problematic Paper Screener flags none of its papers. These are indicators to check, not findings against the journal.
Retractions from OpenAlex; flags from the Problematic Paper Screener (Cabanac, Labbé & Magazinov, CC BY), 2026-09-21 export. A flag marks a paper for a closer look; it is not a finding against the journal.
Index data is curated from public sources (Scopus, Web of Science, ABDC, FT50, UT Dallas, DOAJ). CiteScore and quartiles reflect the latest available Scopus release. Always verify a journal's current status on its official source before submitting.
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